silicon molecular-beam epitaxy
- silicon molecular-beam epitaxy
- molekulinė silicio epitaksija
statusas T sritis radioelektronika
atitikmenys: angl. silicon molecular-beam epitaxy
vok. Silizium-Molekularstrahlepitaxie, f
rus. молекулярно-пучковая эпитаксия кремния, f
pranc. épitaxie de silicium par jet moléculaire, f
Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“.
Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas.
2000.
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Molecular-beam epitaxy — (MBE), is one of several methods of depositing single crystals. It was invented in the late 1960s at Bell Telephone Laboratories by J. R. Arthur and Alfred Y. Cho.MethodMolecular beam epitaxy takes place in high vacuum or ultra high vacuum (10−8… … Wikipedia
Molecular beam epitaxy — A simple sketch showing the main components and rough layout and concept of the main chamber in a Molecular Beam Epitaxy system Molecular beam epitaxy (MBE) is one of several methods of depositing single crystals. It was invented in the late… … Wikipedia
Epitaxy — refers to the method of depositing a monocrystalline film on a monocrystalline substrate. The deposited film is denoted as epitaxial film or epitaxial layer. The term epitaxy comes from a Greek root ( epi above and taxis in ordered manner ) which … Wikipedia
epitaxy — /ep i tak see/, n., pl. epitaxies. Crystall. epitaxis. * * * ▪ crystallography the process of growing a crystal of a particular orientation on top of another crystal, where the orientation is determined by the underlying crystal. The… … Universalium
Ion Beam Mixing — is a process for adhering two multilayers, especially a substrate and deposited surface layer. The process involves bombarding layered samples with doses of ion radiation in order to promote mixing at the interface, and generally serves as a… … Wikipedia
Metalorganic vapour phase epitaxy — (MOVPE), also known as organometallic vapour phase epitaxy (OMVPE) or metalorganic chemical vapour deposition (MOCVD), is a chemical vapour deposition method of epitaxial growth of materials, especially compound semiconductors from the surface… … Wikipedia
Silizium-Molekularstrahlepitaxie — molekulinė silicio epitaksija statusas T sritis radioelektronika atitikmenys: angl. silicon molecular beam epitaxy vok. Silizium Molekularstrahlepitaxie, f rus. молекулярно пучковая эпитаксия кремния, f pranc. épitaxie de silicium par jet… … Radioelektronikos terminų žodynas
molekulinė silicio epitaksija — statusas T sritis radioelektronika atitikmenys: angl. silicon molecular beam epitaxy vok. Silizium Molekularstrahlepitaxie, f rus. молекулярно пучковая эпитаксия кремния, f pranc. épitaxie de silicium par jet moléculaire, f … Radioelektronikos terminų žodynas
épitaxie de silicium par jet moléculaire — molekulinė silicio epitaksija statusas T sritis radioelektronika atitikmenys: angl. silicon molecular beam epitaxy vok. Silizium Molekularstrahlepitaxie, f rus. молекулярно пучковая эпитаксия кремния, f pranc. épitaxie de silicium par jet… … Radioelektronikos terminų žodynas
молекулярно-пучковая эпитаксия кремния — molekulinė silicio epitaksija statusas T sritis radioelektronika atitikmenys: angl. silicon molecular beam epitaxy vok. Silizium Molekularstrahlepitaxie, f rus. молекулярно пучковая эпитаксия кремния, f pranc. épitaxie de silicium par jet… … Radioelektronikos terminų žodynas